ELECTRICAL-RESISTIVITY OF AULN2 THIN-FILMS AT 4.2 K

被引：3
|
作者：
HASUMI, Y [1 ]
ARAI, K [1 ]
WAHO, T [1 ]
YANAGAWA, F [1 ]
机构：
[1] NIPPON TELEGRAPH & TEL PUBL CORP,MUSASHINO ELECT COMMUN LAB,MUSASHINO,TOKYO 180,JAPAN
来源：
JOURNAL OF APPLIED PHYSICS | 1984年 / 55卷 / 02期
关键词：
D O I：
10.1063/1.333102
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：471 / 475
页数：5
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