SOURCE DRAIN CHARACTERISTICS AND FIELD-EFFECT STUDIES OF CDS THIN-FILM FIELD-EFFECT TRANSISTOR STRUCTURES

被引：1
|
作者：
DAS, VD
SRINIVASAN, GS
机构：
来源：
THIN SOLID FILMS | 1984年 / 116卷 / 1-3期
关键词：
D O I：
10.1016/0040-6090(84)90437-1
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
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页码：232 / 232
页数：1
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