LOW-PRESSURE PLASMA STERILIZATION OF PLASTICS

被引:0
|
作者
ROSENBAUER, KA [1 ]
CLAHSEN, H [1 ]
机构
[1] UNIV DUSSELDORF,TOPOG ANAT & BIOMECH ABT,W-4000 DUSSELDORF 1,GERMANY
来源
KUNSTSTOFFE-GERMAN PLASTICS | 1992年 / 82卷 / 05期
关键词
D O I
暂无
中图分类号
TQ [化学工业];
学科分类号
0817 ;
摘要
A third approach to sterilization, in addition to conventional processes, is opened up by the plasma technology. This method has proved to be particularly effective and at the same time to permit gentle treatment of the materials. The low thermal load and the short low pressure plasma treatment open up a variety of different applitions specifically for plastics.
引用
收藏
页码:380 / 382
页数:3
相关论文
共 50 条
  • [41] LOW-PRESSURE SOURCE OF NONEQUILIBRIUM PLASMA.
    Protasevich, E.T.
    Instruments and experimental techniques New York, 1986, 29 (5 pt 2): : 1151 - 1153
  • [42] Generation of uniform plasma in low-pressure discharges
    Nikulin, SP
    INTERNATIONAL CONFERENCE ON PHENOMENA IN IONIZED GASES, VOL III, PROCEEDINGS, 1999, : 95 - 96
  • [43] LOW-PRESSURE PLASMA SYNTHESIS OF NANOSTRUCTURED COATINGS
    Kylian, O.
    ROMANIAN REPORTS IN PHYSICS, 2019, 71 (01)
  • [44] Early low-pressure plasma spraying in Japan
    Hasui, A
    JOURNAL OF THERMAL SPRAY TECHNOLOGY, 1997, 6 (04) : 394 - 395
  • [45] HEATING OF NANOPARTICLES IN LOW-PRESSURE PLASMA JETS
    Kravchenko, O. Yu.
    Maruschak, I. S.
    PROBLEMS OF ATOMIC SCIENCE AND TECHNOLOGY, 2022, (06): : 32 - 35
  • [46] OXYGEN DISSOCIATION COEFFICIENT IN LOW-PRESSURE PLASMA
    KOCIAN, P
    BOURQUARD, S
    HELVETICA PHYSICA ACTA, 1977, 50 (02): : 170 - 170
  • [47] LOW-PRESSURE PLASMA SPRAYING OF REACTIVE MATERIALS
    STEFFENS, HD
    HOHLE, HM
    ERTURK, E
    THIN SOLID FILMS, 1980, 73 (01) : 19 - 29
  • [48] PLASMA PROCESSES IN A LOW-PRESSURE SPARK DISCHARGE
    EPSTEIN, HM
    GALLAGHER, WJ
    MALLOZZI, PJ
    STRATTON, TF
    PHYSICAL REVIEW A-GENERAL PHYSICS, 1970, 2 (01): : 146 - +
  • [49] Low-pressure plasma sources for etching and deposition
    Cooke, MJ
    Hassall, G
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2002, 11 (3A): : A74 - A79
  • [50] Low-pressure chemically reactive plasma dynamics
    Kutepov, AM
    Maksimov, AI
    THEORETICAL FOUNDATIONS OF CHEMICAL ENGINEERING, 1998, 32 (04) : 369 - 378