CONTOURING BY ELECTRONIC SPECKLE PATTERN INTERFEROMETRY EMPLOYING DUAL BEAM ILLUMINATION

被引：50
|
作者：
JOENATHAN, C [1 ]
PFISTER, B [1 ]
TIZIANI, HJ [1 ]
机构：
[1] UNIV STUTTGART,INST TECH OPT,W-7000 STUTTGART 80,GERMANY
来源：
APPLIED OPTICS | 1990年 / 29卷 / 13期
关键词：
ESPI; Interferometry; Speckle interferometry; Speckles;
D O I：
10.1364/AO.29.001905
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
In this paper we extend and study the method for generating contours of diffuse objects employing a dual beam illumination coupled with electronic speckle pattern interferometry. The sensitivity and the orientation of the contour planes are analyzed. A novel method for tilting the planes of contours and experimental results incorporating phase shifting and fringe analysis are also presented. The theoretical and the experimental results show good agreement. © 1990 Optical Society of America.
引用
收藏
页码：1905 / 1911
页数：7
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