THE PROPERTIES OF THE TITANIUM NITRIDE DEPOSITED BY PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITION

被引：0
|
作者：
JANG, DH
KIM, SB
CHUN, JS
KIM, JG
机构：
来源：
PLASMA SURFACE ENGINEERING, VOLS 1 AND 2 | 1989年
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D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
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页码：147 / 153
页数：7
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