THE PROPERTIES OF THE TITANIUM NITRIDE DEPOSITED BY PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITION

被引：0

|

作者：

JANG, DH

KIM, SB

CHUN, JS

KIM, JG

机构：

来源：

PLASMA SURFACE ENGINEERING, VOLS 1 AND 2 | 1989年

关键词：

D O I：

暂无

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：147 / 153

页数：7

相关论文

共 50 条

[1] PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION OF TITANIUM NITRIDE
IANNO, NJ
AHMED, AU
ENGLEBERT, DA
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1986, 133 (08) : C313 - C313
[2] TITANIUM NITRIDE DEPOSITED BY PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION
LAIMER, J
STORI, H
RODHAMMER, P
THIN SOLID FILMS, 1990, 191 (01) : 77 - 89
[3] PROPERTIES OF TITANIUM SILICIDE FILMS DEPOSITED BY PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION
HEMMES, DG
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (06): : 1332 - 1335
[4] CHEMICAL VAPOR-DEPOSITION OF TITANIUM NITRIDE ON PLASMA NITRIDED STEEL
WELLS, A
YATES, SC
JOURNAL OF MATERIALS SCIENCE, 1988, 23 (04) : 1481 - 1485
[5] KINETICS OF CHEMICAL VAPOR-DEPOSITION OF TITANIUM NITRIDE
NAKANISHI, N
MORI, S
KATO, E
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1990, 137 (01) : 322 - 328
[6] PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION OF TITANIUM SULFIDES
SHIMANOUCHI, R
YAMAMOTO, T
KIKKAWA, S
KOIZUMI, M
CHEMISTRY LETTERS, 1985, (09) : 1323 - 1326
[7] PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITION OF TITANIUM DIBORIDE FILMS
WILLIAMS, LM
APPLIED PHYSICS LETTERS, 1985, 46 (01) : 43 - 45
[8] PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION OF SILICON-NITRIDE
KOBAYASHI, I
OGAWA, T
HOTTA, S
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1992, 31 (2A): : 336 - 342
[9] PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITION
GRAVES, DB
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (02) : C38 - C38
[10] PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITION
HESS, DW
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1986, 192 : 9 - IAEC

← 1 2 3 4 5 →