NEAR-SURFACE DAMAGE INDUCED IN POLYIMIDES BY ION-BEAM ETCHING

被引:8
|
作者
VANDERLINDE, WE [1 ]
MILLS, PJ [1 ]
KRAMER, EJ [1 ]
RUOFF, AL [1 ]
机构
[1] CORNELL UNIV,CTR MAT SCI,ITHACA,NY 14853
来源
关键词
D O I
10.1116/1.582994
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:1362 / 1364
页数:3
相关论文
共 50 条
  • [11] DOSE DEPENDENCE OF THE SILICON NEAR-SURFACE MODIFICATIONS CAUSED BY CF4 REACTIVE ION-BEAM ETCHING
    LEJEUNE, C
    GRANDCHAMP, JP
    GILLES, JP
    COLLARD, E
    SCHEIBLIN, P
    JOURNAL OF APPLIED PHYSICS, 1989, 65 (05) : 2156 - 2159
  • [12] CARBONACEOUS OVERLAYER AND NEAR-SURFACE DAMAGE AFTER PURE CF4 REACTIVE ION-BEAM ETCHING OF SILICON - EXPOSURE DOSE EFFECTS
    LEJEUNE, C
    GRANDCHAMP, JP
    GILLES, JP
    COLLARD, E
    SCHEIBLIN, P
    APPLIED SURFACE SCIENCE, 1989, 36 (1-4) : 350 - 361
  • [13] DAMAGE CAUSED BY AR ION-BEAM ETCHING
    YANO, H
    HASHIMOTO, H
    TOYAMA, Y
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (03) : C155 - C155
  • [14] Ion beam-induced sintering of near-surface layers
    Föhl, A
    Carstanjen, HD
    SURFACE & COATINGS TECHNOLOGY, 2002, 158 : 69 - 74
  • [15] ION-BEAM ETCHING
    LIEBEL, G
    F&M-FEINWERKTECHNIK & MESSTECHNIK, 1987, 95 (07): : 436 - 440
  • [16] ION-BEAM ETCHING
    GLOERSEN, PG
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (01): : 28 - 35
  • [17] Detailed near-surface nanoscale damage precursor measurement and characterization of fused silica optics assisted by ion beam etching
    Zhong, Yaoyu
    Shi, Feng
    Tian, Ye
    Dai, Yifan
    Song, Ci
    Zhang, Wanli
    Lin, Zhifan
    OPTICS EXPRESS, 2019, 27 (08) : 10826 - 10838
  • [18] OPTICAL DEPTH PROFILING OF ION-BEAM ETCHING INDUCED DAMAGE IN INGAAS/INP HETEROSTRUCTURES
    GERMANN, R
    FORCHEL, A
    GRUTZMACHER, D
    APPLIED PHYSICS LETTERS, 1989, 55 (21) : 2196 - 2198
  • [19] DETERMINATION OF ION-BEAM ETCHING DAMAGE ON INP BY SPECTROSCOPIC ELLIPSOMETRY
    DINGES, HW
    KEMPF, B
    BURKHARD, H
    GOBEL, R
    APPLIED SURFACE SCIENCE, 1991, 50 (1-4) : 359 - 363
  • [20] AR ION-BEAM ETCHING CHARACTERISTICS AND DAMAGE PRODUCTION IN INP
    WADA, O
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1984, 17 (12) : 2429 - 2437