RESPUTTERING EFFECT ON Y1BA2CU3O7-D THIN-FILMS PREPARED BY RF-MAGNETRON SPUTTERING

被引：9

作者：

ENAMI, H ^{[1
]}

SHINOHARA, T ^{[1
]}

KAWAHARA, N ^{[1
]}

KAWABATA, S ^{[1
]}

HOSHIZAKI, H ^{[1
]}

IMURA, T ^{[1
]}

机构：

[1] AICHI INST TECHNOL,DEPT MECH ENGN,YAGUSA,TOYOTA 47003,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1990年 / 29卷 / 05期

关键词：

Optical emission spectroscopy; Resputtering effect; Rf-magnetron sputtering; Superconductor Y1Ba2Cu307; Thin film;

D O I：

10.1143/JJAP.29.L782

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Y1Ba2Cu3O7-δ thin films were prepared on MgO(001) substrates by rf-magnetron sputtering. The influence of oxygen partial pressure on film preparation has been investigated quantitatively. The oxygen flow rate near the substrate was controlled by an oxygen inlet ring. As-deposited films in an appropriate condition of oxygen flow rate show a superconducting transition at 83 K. When too much oxygen gas is introduced into a chamber, as-deposited films are damaged by resputtering and their superconducting property disappears. The growth mechanism of the thin films is discussed in terms of the resputtering effect. © 1990 The Japan Society of Applied Physics.

引用

页码：L782 / L784

页数：3

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