DYNAMIC-IMPLANT PROFILING BY LOW-ENERGY NUCLEAR-REACTION SPECTROSCOPY

被引：0
|
作者：
COWGILL, DF [1 ]
机构：
[1] SANDIA LABS,ALBUQUERQUE,NM 87115
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1977年 / 14卷 / 01期
关键词：
D O I：
10.1116/1.569288
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：501 / 501
页数：1
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