A two-step light soaking experiment at high and low intensities provided convincing evidence that defect generation and annealing in a-Si:H are controlled by defect states of different characteristics. We point out that the total defect by itself cannot uniquely determine the state of material or be described by a single rate equation, even though it might be the only quantity that is experimentally measurable. A system of rate equations for all defect components, therefore, must be established in order to accurately describe the defect kinetics. A simple two-component model in which defects are categorized as fast or slow is shown to be adequate to explain a variety of experimental results in a consistent fashion.
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Delft Univ Technol, Photovolta Mat & Devices, Fac Elect Engn Math & Comp Sci, NL-2628 CD Delft, NetherlandsDelft Univ Technol, Photovolta Mat & Devices, Fac Elect Engn Math & Comp Sci, NL-2628 CD Delft, Netherlands
Melskens, J.
Schnegg, A.
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Helmholtz Zentrum Berlin Mat & Energie, Berlin Joint EPR lab, Inst Silizium Photovolta, D-12489 Berlin, GermanyDelft Univ Technol, Photovolta Mat & Devices, Fac Elect Engn Math & Comp Sci, NL-2628 CD Delft, Netherlands
Schnegg, A.
Baldansuren, A.
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Helmholtz Zentrum Berlin Mat & Energie, Berlin Joint EPR lab, Inst Silizium Photovolta, D-12489 Berlin, GermanyDelft Univ Technol, Photovolta Mat & Devices, Fac Elect Engn Math & Comp Sci, NL-2628 CD Delft, Netherlands
Baldansuren, A.
Lips, K.
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Helmholtz Zentrum Berlin Mat & Energie, Berlin Joint EPR lab, Inst Silizium Photovolta, D-12489 Berlin, GermanyDelft Univ Technol, Photovolta Mat & Devices, Fac Elect Engn Math & Comp Sci, NL-2628 CD Delft, Netherlands
Lips, K.
Plokker, M. P.
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Delft Univ Technol, Fac Sci Appl, Fundamental Aspects Mat & Energy, NL-2629 JB Delft, NetherlandsDelft Univ Technol, Photovolta Mat & Devices, Fac Elect Engn Math & Comp Sci, NL-2628 CD Delft, Netherlands
Plokker, M. P.
Eijt, S. W. H.
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Delft Univ Technol, Fac Sci Appl, Fundamental Aspects Mat & Energy, NL-2629 JB Delft, NetherlandsDelft Univ Technol, Photovolta Mat & Devices, Fac Elect Engn Math & Comp Sci, NL-2628 CD Delft, Netherlands
Eijt, S. W. H.
Schut, H.
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Delft Univ Technol, Fac Sci Appl, Neutron & Positron Methods Mat, NL-2629 JB Delft, NetherlandsDelft Univ Technol, Photovolta Mat & Devices, Fac Elect Engn Math & Comp Sci, NL-2628 CD Delft, Netherlands
Schut, H.
Fischer, M.
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Delft Univ Technol, Photovolta Mat & Devices, Fac Elect Engn Math & Comp Sci, NL-2628 CD Delft, NetherlandsDelft Univ Technol, Photovolta Mat & Devices, Fac Elect Engn Math & Comp Sci, NL-2628 CD Delft, Netherlands
Fischer, M.
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Zeman, M.
Smets, A. H. M.
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Delft Univ Technol, Photovolta Mat & Devices, Fac Elect Engn Math & Comp Sci, NL-2628 CD Delft, NetherlandsDelft Univ Technol, Photovolta Mat & Devices, Fac Elect Engn Math & Comp Sci, NL-2628 CD Delft, Netherlands