RAPID THERMAL NITRIDATION OF THIN THERMAL SILICON DIOXIDE FILMS

被引：24
|
作者：
NULMAN, J [1 ]
KRUSIUS, JP [1 ]
机构：
[1] CORNELL UNIV,NATL RES & RESOURCE FACIL SUBMICRON STRUCT,ITHACA,NY 14853
来源：
APPLIED PHYSICS LETTERS | 1985年 / 47卷 / 02期
关键词：
D O I：
10.1063/1.96244
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：148 / 150
页数：3
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