CONDITIONS FOR DEPOSITION OF DIELECTRIC SIO2 AND SI3N4 FILMS IN A VERTICAL REACTOR

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作者
KUZNETSOV, YN
PROKOPEV, EP
KOROBOV, IV
KOLTSOVA, NG
PAVLOV, SP
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JOURNAL OF APPLIED CHEMISTRY OF THE USSR | 1976年 / 49卷 / 03期
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O69 [应用化学];
学科分类号
081704 ;
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页码:695 / 697
页数:3
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