CONTAMINATION DERIVED FROM O-RINGS OF ELECTRONIC CHEMICALS

被引：0
|
作者：
HOSTALEK, M
BUTTNER, W
JAMMER, W
FEIG, H
HOFLER, H
机构：
[1] E. Merck, Darmstadt, W-6100, Frankfurter Strasse
来源：
FRESENIUS JOURNAL OF ANALYTICAL CHEMISTRY | 1992年 / 343卷 / 9-10期
关键词：
D O I：
10.1007/BF00633552
中图分类号：
O65 [分析化学];
学科分类号：
070302 ; 081704 ;
摘要：
Different O-rings are investigated with respect to their application with high purity electronic chemicals. Hydrochloric acid, nitric acid, sulfuric acid and ammonia solution were used in leaching tests. The analytical results show that the deterioration levels are chemical specific and vary strongly between the different O-rings. O-rings made from perfluoro elastomers are relatively free from contamination.
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页码：725 / 726
页数：2
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