ELECTRICAL CHARACTERISTICS OF FAST RADIATIVELY PROCESSED TITANIUM SILICIDES THIN-FILMS

被引：12

|

作者：

WEI, CS

VANDERSPIEGEL, J

SANTIAGO, J

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1985年 / 3卷 / 06期

关键词：

D O I：

10.1116/1.572903

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

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页码：2259 / 2263

页数：5

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