PULSED LASER-INDUCED RECOMBINATION CENTERS IN SILICON

被引:1
|
作者
HLAVKA, J [1 ]
JELINKOVA, H [1 ]
HAMAL, K [1 ]
PROCHOCKY, V [1 ]
机构
[1] CZECHOSLOVAKIA TECH UNIV, FAC NUCL SCI & PHYS ENGN, DEPT PHYS ELECTR, CS-11519 PRAGUE, CZECHOSLOVAKIA
关键词
D O I
10.1063/1.334061
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:1245 / 1246
页数:2
相关论文
共 50 条
  • [21] LASER-INDUCED OXIDATION OF SILICON
    BOYD, IW
    WILSON, JIB
    WEST, JL
    THIN SOLID FILMS, 1981, 83 (04) : L173 - L176
  • [22] PULSED LASER-INDUCED DAMAGE TO DIAMOND
    KLEIN, CA
    DIAMOND FILMS AND TECHNOLOGY, 1995, 5 (03): : 141 - 158
  • [23] LASER-INDUCED AUTOIONIZATION WITH PULSED EXCITATION
    BUFFA, R
    CAVALIERI, S
    PHYSICAL REVIEW A, 1990, 42 (09): : 5481 - 5485
  • [24] SPECTROSCOPIC INVESTIGATION OF RECOMBINATION PROCESS IN A PULSED DISCHARGE PLASMA USING LASER-INDUCED FLUORESCENCE TECHNIQUE
    USUI, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1984, 23 (04): : 468 - 474
  • [25] Laser-induced amorphization of silicon during pulsed-laser irradiation of TiN/Ti/polycrystalline silicon/SiO2/silicon
    Chong, YF
    Pey, KL
    Wee, ATS
    Thompson, MO
    Tung, CH
    See, A
    APPLIED PHYSICS LETTERS, 2002, 81 (20) : 3786 - 3788
  • [26] LASER-INDUCED AUGER RECOMBINATION IN DOPED SEMICONDUCTORS
    CHERNYSH, LV
    KOVARSKII, VA
    SINYAVSKII, EP
    PHYSICA STATUS SOLIDI B-BASIC RESEARCH, 1981, 105 (01): : K51 - K53
  • [27] Laser-induced dissociative recombination of carbon dioxide
    Hu, Hongtao
    Larimian, Seyedreza
    Erattupuzha, Sonia
    Wen, Jin
    Baltuska, Andrius
    Kitzler-Zeiler, Markus
    Xie, Xinhua
    PHYSICAL REVIEW RESEARCH, 2019, 1 (03):
  • [28] Laser-induced vibration during pulsed laser forming
    Hsieh, HS
    Lin, JM
    OPTICS AND LASER TECHNOLOGY, 2004, 36 (06): : 431 - 439
  • [29] Silicon nanocrystals formed by pulsed laser-induced fragmentation of electrochemically etched Si micrograms
    Svrcek, Vladimir
    Sasaki, Takeshi
    Shimizu, Yoshiki
    Koshizaki, Naoto
    CHEMICAL PHYSICS LETTERS, 2006, 429 (4-6) : 483 - 487
  • [30] LASER-INDUCED CHEMICAL ETCHING OF SILICON IN CHLORINE ATMOSPHERE .1. PULSED IRRADIATION
    KULLMER, R
    BAUERLE, D
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1987, 43 (03): : 227 - 232