CONTROL OF SILICON DIOXIDE PROPERTIES BY RF SPUTTERING

被引：4
|
作者：
LEE, MK
CHANG, CY
TZENG, JS
SU, YK
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1983年 / 130卷 / 03期
关键词：
D O I：
10.1149/1.2119776
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：658 / 659
页数：2
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