OPTIMIZATION AND CHARACTERIZATION OF SINGLE LAYER RESIST TECHNIQUES FOR 1-MU-M CMOS PRODUCTION

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作者：
KARNETT, MP
SARNOFF, MC
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来源：
OPTICAL/LASER MICROLITHOGRAPHY II | 1989年 / 1088卷
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TM [电工技术]; TN [电子技术、通信技术];
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0808 ; 0809 ;
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页码：324 / 338
页数：15
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