LIMITATION OF CRITICAL CURRENT-DENSITY BY INTERMETALLIC FORMATION IN FINE FILAMENT NB-TI SUPERCONDUCTORS

被引：8
|
作者：
LARBALESTIER, DC
LI, CG
STARCH, W
LEE, PJ
机构：
来源：
IEEE TRANSACTIONS ON NUCLEAR SCIENCE | 1985年 / 32卷 / 05期
关键词：
D O I：
10.1109/TNS.1985.4334488
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：3743 / 3745
页数：3
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