REDUCTION PHOTOLITHOGRAPHY BY ABLATION AT WAVELENGTH 193-NM

被引：6

作者：

GOODALL, FN ^{[1
]}

MOODY, RA ^{[1
]}

WELFORD, WT ^{[1
]}

机构：

[1] UNIV LONDON IMPERIAL COLL SCI & TECHNOL,BLACKETT LAB,LONDON SW7 2BZ,ENGLAND

来源：

OPTICS COMMUNICATIONS | 1986年 / 57卷 / 04期

关键词：

ABLATION; -; LASERS; EXCIMER; Applications; PHOTORESISTS;

D O I：

10.1016/0030-4018(86)90087-8

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

An excimer laser operating at 193 nm was used with specially designed objectives of numerical apertures 0. 11 and 0. 17 to record photomasks on photoresist by direct ablation. Structure less than 0. 5 mu m in size was recorded clearly.

引用

页码：227 / 229

页数：3

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