CHARACTERISTICS OF RADIOFREQUENCY SILICON-CARBIDE FILMS

被引：16
|
作者：
RAVEH, A
INSPEKTOR, A
CARMI, U
AVNI, R
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1987年 / 5卷 / 05期
关键词：
D O I：
10.1116/1.574317
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：2836 / 2841
页数：6
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