ON NATURE OF INTERFACE STATES IN AN SIO2-SI SYSTEM AND ON INFLUENCE OF HEAT TREATMENTS ON OXIDE CHARGE

被引：0
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作者：
WHELAN, MV
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来源：
PHILIPS RESEARCH REPORTS | 1967年 / 22卷 / 03期
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中图分类号：
O6 [化学];
学科分类号：
0703 ;
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页码：289 / +
页数：1
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