EPITAXIAL SILICIDE FORMATION BY MULTI-SHOT IRRADIATION OF NI THIN-FILMS ON SI WITH ND LASER

被引：11
|
作者：
HARITH, MA
ZHANG, JP
BAERI, P
RIMINI, E
CELOTTI, G
机构：
[1] UNIV CATANIA,IST DIPARTIMENTALE FIS,I-95129 CATANIA,ITALY
[2] CNR,LAMEL,I-40100 BOLOGNA,ITALY
来源：
JOURNAL OF APPLIED PHYSICS | 1985年 / 57卷 / 10期
关键词：
D O I：
10.1063/1.335360
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：4560 / 4565
页数：6
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