RADIATION-INDUCED MOBILITY OF SUBSTITUTIONAL HYDROGEN IN MGO

被引：16

作者：

CHEN, Y ^{[1
]}

ABRAHAM, MM ^{[1
]}

TEMPLETON, LC ^{[1
]}

机构：

[1] OAK RIDGE NATL LAB,DIV SOLID STATE,OAK RIDGE,TN 37830

来源：

JOURNAL OF THE AMERICAN CERAMIC SOCIETY | 1977年 / 60卷 / 3-4期

关键词：

D O I：

10.1111/j.1151-2916.1977.tb15480.x

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：101 / 104

页数：4

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