CARBON BACKGROUND IN P-BASED III-V SEMICONDUCTORS GROWN BY METALORGANIC MOLECULAR-BEAM EPITAXY USING ETHYL-METALORGANIC SOURCES

Electrical properties of InP, GaP, InGaP and AlGaP, grown by metalorganic molecular beam epitaxy(MOMBE) using ethyl-metalorganics (triethyl-indium, -gallium and -alluminum), are discussed in connection with the carbon background. More C atoms are incorporated into epilayers in the order of ALGaP, GaP and InP. The C atoms act as accepters in AlGaP and GaP epilayers, but they probably work as donors in InP. InGaP showed highly resistive or compensated possibly due to the amphoteric nature of C atoms.