FLUORIDE CONTENTS OF SURFACE ENAMEL IN HIGH-FLUORIDE AND LOW-FLUORIDE AREAS STUDIED WITH A SENSITIVE PHYSICAL METHOD

被引：0
|
作者：
RYTOMAA, I
KLEEMOLA.E
KEINONEN, J
ANTTILA, A
机构：
[1] UNIV HELSINKI,INST DENT,FABIANINKATU 24,HELSINKI 10,FINLAND
[2] UNIV HELSINKI,DEPT PHYS,HELSINKI,FINLAND
来源：
SCANDINAVIAN JOURNAL OF DENTAL RESEARCH | 1974年 / 82卷 / 03期
关键词：
D O I：
暂无
中图分类号：
R78 [口腔科学];
学科分类号：
1003 ;
摘要：
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页码：197 / 201
页数：5
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