DIELECTRIC AND STRUCTURAL-PROPERTIES OF VACUUM-DEPOSITED NIOBIUM OXIDE-FILMS

被引：0

作者：

GOSWAMI, AP ^{[1
]}

GOSWAMI, A ^{[1
]}

机构：

[1] NATL CHEM LAB,POONA 8,INDIA

来源：

INDIAN JOURNAL OF PURE & APPLIED PHYSICS | 1974年 / 12卷 / 01期

关键词：

D O I：

暂无

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

页码：26 / 31

页数：6

共 50 条

[41] OPTICAL-PROPERTIES OF VACUUM-DEPOSITED SNS FILMS
GOSWAMI, A
MITRA, A
[J]. INDIAN JOURNAL OF PURE & APPLIED PHYSICS, 1975, 13 (08) : 508 - 511
[42] DIELECTRIC PROPERTIES OF YTTERBIUM OXIDE-FILMS DEPOSITED BY ELECTRON-BEAM EVAPORATION
WIKTORCZYK, T
WESOLOWSKA, C
[J]. THIN SOLID FILMS, 1979, 58 (02) : 313 - 313
[43] Structural and optical properties of vacuum-deposited ZnS nanostructures
Kurbatov, D.
Opanasyuk, A.
Sofronov, D.
Khlyap, H.
[J]. PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2013, 210 (02): : 291 - 296
[44] ELECTRICAL AND STRUCTURAL-PROPERTIES OF LOW RESISTIVITY TIN-DOPED INDIUM OXIDE-FILMS
SHIGESATO, Y
TAKAKI, S
HARANOH, T
[J]. JOURNAL OF APPLIED PHYSICS, 1992, 71 (07) : 3356 - 3364
[45] Structural and dielectric properties of energetically deposited hafnium oxide films
Murdoch, B. J.
McCulloch, D. G.
Partridge, J. G.
[J]. SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2014, 29 (12)
[46] ADHESION MEASUREMENTS OF VACUUM-DEPOSITED FILMS
KINBARA, A
[J]. JOURNAL OF JAPAN SOCIETY OF LUBRICATION ENGINEERS, 1987, 32 (09): : 638 - 641
[47] POLYMORPHISM IN VACUUM-DEPOSITED GAP FILMS
DAVEY, JE
PANKEY, T
[J]. APPLIED PHYSICS LETTERS, 1968, 12 (02) : 38 - &
[48] PROPERTIES AND APPLICATIONS OF VACUUM-DEPOSITED CU-CR FILMS
SCHUMANN, J
BRUCKNER, W
HEINRICH, A
[J]. THIN SOLID FILMS, 1993, 228 (1-2) : 44 - 48
[49] Permeation in vacuum-deposited thin films
Park, JC
Lee, YJ
[J]. JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2003, 42 (01) : 85 - 89
[50] STRUCTURE OF VACUUM-DEPOSITED CHROMIUM FILMS
IVANTSEV, AS
KRIVOROT.YA
ALEKSAND.LN
[J]. PHYSICS OF METALS AND METALLOGRAPHY-USSR, 1970, 30 (06): : 41 - &

← 1 2 3 4 5 →