THE CHEMICAL SPUTTERING OF SILICA BY AR+ IONS AND XEF2

被引：18
|
作者：
LOUDIANA, MA [1 ]
SCHMID, A [1 ]
DICKINSON, JT [1 ]
ASHLEY, EJ [1 ]
机构：
[1] USN,CTR WEAP,CHINA LAKE,CA 93555
来源：
SURFACE SCIENCE | 1984年 / 141卷 / 2-3期
关键词：
D O I：
10.1016/0039-6028(84)90140-7
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
引用
收藏
页码：409 / 416
页数：8
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