CHARGE STORAGE IN METAL-SILICON NITRIDE-SILICON CAPACITORS

被引:4
|
作者
HUTCHINS, CL
LADE, RW
机构
关键词
D O I
10.1109/PROC.1967.5861
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:1494 / &
相关论文
共 50 条
  • [31] Characteristics and Charge Storage of Silicon Quantum Dots Embedded in Silicon Nitride Film
    Wugang Liao
    Xiangbin Zeng
    Xixing Wen
    Wenjun Zheng
    Yangyang Wen
    Wei Yao
    Journal of Electronic Materials, 2015, 44 : 1015 - 1020
  • [32] METAL-SILICON JUNCTIONS FORMED BY METAL IONS
    WOLTER, AR
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1968, 115 (11) : C324 - &
  • [33] Preparation and characterisation of aluminium nitride-silicon carbide composites
    Tangen, IL
    Yu, YD
    Grande, T
    Mokkelbost, T
    Hoier, R
    Einarsrud, MA
    CERAMICS INTERNATIONAL, 2004, 30 (06) : 931 - 938
  • [34] Electrical Properties of Metal-Silicon Nitride-Hydrogenated Amorphous Silicon Capacitor Elucidated Using Admittance Spectroscopy
    Hsieh, Ming-Ta
    Chen, Jenn-Fang
    Yen, Kuo-Hsi
    Zan, Hsiao-Wen
    Chang, Chan-Ching
    Chen, Chih-Hsien
    Shih, Ching-Chieh
    Lee, Yeong-Shyang
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2008, 47 (12) : 8714 - 8718
  • [35] BARRIER ENERGIES IN METAL-SILICON DIOXIDE-SILICON STRUCTURES
    DEAL, BE
    SNOW, EH
    MEAD, CA
    JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1966, 27 (11-1) : 1873 - &
  • [36] RECTIFICATION PROPERTIES OF METAL-SILICON CONTACTS
    WURST, EC
    BORNEMAN, EH
    JOURNAL OF APPLIED PHYSICS, 1957, 28 (02) : 235 - 240
  • [38] Evaluation of electron shading charge buildup damage using metal-nitride-oxide-silicon capacitors
    Mitsubishi Electric Corp, Hyogo, Japan
    Jpn J Appl Phys Part 1 Regul Pap Short Note Rev Pap, 4 B (2521-2525):
  • [39] Evaluation of electron shading charge buildup damage using metal-nitride-oxide-silicon capacitors
    Sakaimori, S
    Maruyama, T
    Fujiwara, N
    Miyatake, H
    Yoneda, M
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (4B): : 2521 - 2525
  • [40] SILICIDE FORMATION BY METAL-SILICON INTERACTIONS
    TU, KN
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (03) : C78 - C78