PLASMA CONTROL METHOD FOR DRY ETCHING PROCESS

被引：0
|
作者：
KAKEHI, Y [1 ]
HARADA, T [1 ]
OOMOTO, Y [1 ]
NAKAZATO, N [1 ]
机构：
[1] HITACHI LTD,MECH ENGN RES LAB,DEPT 7,KUDAMATSU,YAMAGUCHI 744,JAPAN
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1986年 / 133卷 / 03期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：C133 / C133
页数：1
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