HIGH-PRESSURE REACTIONS OF SF6 AND PF3

被引：0
|
作者：
HAGEN, AP [1 ]
CALLAWAY, BW [1 ]
机构：
[1] UNIV OKLAHOMA,DEPT CHEM,NORMAN,OK 73069
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 1975年 / 169期
关键词：
D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
引用
收藏
页码：47 / 48
页数：2
相关论文
共 50 条
  • [41] Impact of Volume Breakdown on Surface Flashover in High Pressure SF6
    Neuber, A. A.
    Krile, J. T.
    Rogers, G.
    Krompholz, H.
    ACTA PHYSICA POLONICA A, 2009, 115 (06) : 995 - 997
  • [42] Analysis of a laser induced plasma in high pressure SF6 gas
    Clark, W. T.
    Savage, M. E.
    Bliss, D. E.
    Stoltzfus, B. S.
    Woodworth, J. R.
    Gilmore, Mark
    2007 IEEE PULSED POWER CONFERENCE, VOLS 1-4, 2007, : 129 - +
  • [43] Comparison Between Air and SF6 Breakdown by Microwaves at High Pressure
    Zhao, Pengcheng
    Guo, Lixin
    Zhao, Hua
    Chang, Chao
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 2018, 46 (08) : 2794 - 2799
  • [44] Influence of Tiny Metal Particles on Charge Accumulation Phenomena of GIS Model Spacer in High-pressure SF6 Gas
    Iwabuchi, Hiroyuki
    Matsuoka, Shigeyasu
    Kumada, Akiko
    Hidaka, Kunihiko
    Hoshina, Yoshikazu
    Yasuoka, Takanori
    Takei, Masafumi
    IEEE TRANSACTIONS ON DIELECTRICS AND ELECTRICAL INSULATION, 2013, 20 (05) : 1895 - 1901
  • [45] EFFECTS OF HIGH-PRESSURE SF6 GAS DISSOLVED IN AN INSULATING OIL ON DC CONDUCTION CURRENTS AND AC PARTIAL DISCHARGES
    HIRANO, T
    JOURNAL OF APPLIED PHYSICS, 1984, 55 (01) : 9 - 14
  • [46] Dynamics of ionization processes in high-pressure nitrogen, air, and SF6 during a subnanosecond breakdown initiated by runaway electrons
    V. F. Tarasenko
    D. V. Beloplotov
    M. I. Lomaev
    Plasma Physics Reports, 2015, 41 : 832 - 846
  • [47] Dynamics of ionization processes in high-pressure nitrogen, air, and SF6 during a subnanosecond breakdown initiated by runaway electrons
    Tarasenko, V. F.
    Beloplotov, D. V.
    Lomaev, M. I.
    PLASMA PHYSICS REPORTS, 2015, 41 (10) : 832 - 846
  • [48] High-pressure phases of SF6 up to 32 GPa from X-ray diffraction and Raman spectroscopy
    Rademacher, N.
    Friedrich, A.
    Morgenroth, W.
    Bayarjargal, L.
    Milman, V.
    Winkler, B.
    JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 2015, 80 : 11 - 21
  • [49] Capacitively Coupled SF6, SF6/O-2, SF6/CH4 Plasma Etching of Acrylic at Low Vacuum Pressure
    Park, Yeon-Hyun
    Joo, Young-Woo
    Kim, Jaek-Won
    Noh, Ho-Seob
    Lee, Je-Won
    KOREAN JOURNAL OF MATERIALS RESEARCH, 2009, 19 (02): : 68 - 72
  • [50] Interfacial reactions between SF6 and molten magnesium
    Walzak, MJ
    Davidson, RD
    McIntyre, NS
    Argo, D
    Davis, BR
    MAGNESIUM TECHNOLOGY 2001, 2001, : 37 - 41
12345