REDEPOSITION IN AES SPUTTER DEPTH PROFILING OF MULTILAYER CR/NI THIN-FILMS

被引：16
|
作者：
ZALAR, A [1 ]
HOFMANN, S [1 ]
机构：
[1] MAX PLANCK INST MET RES, D-7000 STUTTGART 80, GERMANY
来源：
SURFACE AND INTERFACE ANALYSIS | 1988年 / 12卷 / 1-12期
关键词：
D O I：
10.1002/sia.740120204
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Films
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页码：83 / 86
页数：4
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