LARGE ACTIVATION OF PRASEODYMIUM IN IN0.53GA0.47AS

被引:0
|
作者
NOVAK, J
HASENOHRL, S
MALACKY, L
机构
[1] Inst. of Electr. Eng., Slovak Acad. of Sci., Bratislava
关键词
D O I
10.1088/0268-1242/8/5/023
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The electrical properties of Pr-doped In0.53Ga0.47As LPE epitaxial layers have been studied. Layers prepared by adding a small amount of PrO2 to the melt are n-type and they are insensitive to the temperature treatment. p-type epitaxial layers were grown when more than 1 mg of PrO2 per 1 g of In was added to the melt. Annealing at a temperature of 400-degrees-C results in drastic changes of the electrical parameters and influences the photoluminescent spectra of p-layers. Praseodymium can be activated in a thin near-surface layer independently of the protective gas or metal covering. Additional annealing of the activated layers at higher temperatures has no further influence on the parameters. After removing the thin surface layer by chemical etching the previous electrical parameters can be obtained.
引用
收藏
页码:747 / 749
页数:3
相关论文
共 50 条
  • [21] An In0.53Ga0.47As/In0.52Al0.48As/In0.53Ga0.47As double hetero-junction junctionless TFET
    Liu, Hu
    Yang, Lin-An
    Zhang, Huawei
    Zhang, Bingtao
    Zhang, Wenting
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2021, 60 (07)
  • [22] Maximizing electrical activation of ion-implanted Si in In0.53Ga0.47As
    Lind, A. G.
    Rudawski, N. G.
    Vito, N. J.
    Hatem, C.
    Ridgway, M. C.
    Hengstebeck, R.
    Yates, B. R.
    Jones, K. S.
    APPLIED PHYSICS LETTERS, 2013, 103 (23)
  • [23] Electrical activation of ion implanted Si in amorphous and crystalline In0.53Ga0.47As
    Lind, A. G.
    Gill, M. A.
    Hatem, C.
    Jones, K. S.
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2014, 337 : 7 - 10
  • [24] INVESTIGATION OF MOLECULAR-BEAM EPITAXIAL IN0.53GA0.47AS REGROWN ON LIQUID-PHASE EPITAXIAL IN0.53GA0.47AS/INP
    NASHIMOTO, Y
    DHAR, S
    HONG, WP
    CHIN, A
    BERGER, P
    BHATTACHARYA, PK
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (02): : 540 - 542
  • [25] Lg = 50 nm Gate-All-Around In0.53Ga0.47As Nanosheet MOSFETs with Regrown In0.53Ga0.47As Contacts
    Lee, In-Geun
    Jo, Hyeon-Bhin
    Baek, Ji-Min
    Lee, Sang-Tae
    Choi, Su-Min
    Kim, Hyo-Jin
    Park, Wan-Soo
    Yoo, Ji-Hoon
    Ko, Dae-Hong
    Kim, Tae-Woo
    Kim, Sang-Kuk
    Kim, Jae-Gyu
    Yun, Jacob
    Kim, Ted
    Lee, Jung-Hee
    Shin, Chan-Soo
    Lee, Jae-Hak
    Seo, Kwang-Seok
    Kim, Dae-Hyun
    ELECTRONICS, 2022, 11 (17)
  • [26] TRANSFERRED-ELECTRON OSCILLATIONS IN IN0.53GA0.47AS
    ZHAO, YY
    WEI, CJ
    BENEKING, H
    ELECTRONICS LETTERS, 1982, 18 (19) : 835 - 836
  • [27] A crystalline oxide passivation on In0.53Ga0.47As (100)
    Qin, Xiaoye
    Wang, Wei-E
    Droopad, Ravi
    Rodder, Mark S.
    Wallace, Robert M.
    JOURNAL OF APPLIED PHYSICS, 2017, 121 (12)
  • [28] Carrier transport in ordered and disordered In0.53Ga0.47As
    Ahrenkiel, RK
    Ahrenkiel, SP
    Arent, DJ
    Olson, JM
    Wanlass, M
    THIN FILMS - STRUCTURE AND MORPHOLOGY, 1997, 441 : 181 - 186
  • [29] Carrier transport in ordered and disordered In0.53Ga0.47As
    Ahrenkiel, RK
    Ahrenkiel, SP
    Arent, DJ
    Olson, JM
    APPLIED PHYSICS LETTERS, 1997, 70 (06) : 756 - 758
  • [30] LUMINESCENCE IN ION-IMPLANTED IN0.53GA0.47AS
    SHAH, J
    TELL, B
    BRIDGES, TJ
    BURKHARDT, EG
    DIGIOVANNI, AE
    BROWNGOEBELER, K
    APPLIED PHYSICS LETTERS, 1985, 47 (02) : 146 - 148