PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION OF TIN OXIDE COATINGS

被引：2
|
作者：
INAL, OT
BENGISU, M
GUARDIAN, J
机构：
[1] Materials and Metallurgical Engineering Department, New Mexico Tech, Socorro, 87801, New Mexico
来源：
JOURNAL OF MATERIALS SCIENCE | 1993年 / 28卷 / 05期
关键词：
D O I：
10.1007/BF01191946
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
A feasibility study was performed to assess the potential of plasma-assisted chemical vapour deposition as a method for the coating of carbon fibre bundles. Rayon-based carbon filaments, in 2000-filament tows, were coated with SnO2. Direct-current and hollow-cathode discharges generated in an SnCl4-O2 medium helped to deposit the SnO2 coatings on fibres that were heated to approximately 800-degrees-C, by plasma bombardment, and kept in the plasma for 15 min. Both routes were shown to produce uniform and well adhered coatings, and also to offer advantages in terms of processing temperature and the possibility of continuous processing.
引用
收藏
页码：1155 / 1160
页数：6
相关论文
共 50 条
  • [31] SELECTIVE NUCLEATION AND GROWTH OF DIAMOND PARTICLES BY PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION
    MA, JS
    KAWARADA, H
    YONEHARA, T
    SUZUKI, J
    WEI, J
    YOKOTA, Y
    HIRAKI, A
    APPLIED PHYSICS LETTERS, 1989, 55 (11) : 1071 - 1073
  • [32] PLASMA-ASSISTED VAPOR-DEPOSITION PROCESSES AND SOME APPLICATIONS
    BUNSHAH, RF
    DESHPANDEY, CV
    SURFACE & COATINGS TECHNOLOGY, 1986, 27 (01): : 1 - 21
  • [33] IONIZATION IN PLASMA-ASSISTED PHYSICAL VAPOR-DEPOSITION SYSTEMS
    MATTHEWS, A
    FANCEY, KS
    JAMES, AS
    LEYLAND, A
    SURFACE & COATINGS TECHNOLOGY, 1993, 61 (1-3): : 121 - 126
  • [34] CRITICAL ISSUES IN PLASMA-ASSISTED VAPOR-DEPOSITION PROCESSES
    BUNSHAH, RF
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 1990, 18 (06) : 846 - 854
  • [35] CHEMICAL VAPOR-DEPOSITION DENSIFICATION OF PLASMA-SPRAYED OXIDE COATINGS
    MANTYLA, T
    VUORISTO, P
    KETTUNEN, P
    THIN SOLID FILMS, 1984, 118 (04) : 437 - 444
  • [36] LOW FRICTION COATINGS OF DIAMOND-LIKE CARBON WITH SILICON PREPARED BY PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION
    OGURI, K
    ARAI, T
    JOURNAL OF MATERIALS RESEARCH, 1990, 5 (11) : 2567 - 2571
  • [37] REACTION-MECHANISMS OF PLASMA-ASSISTED AND THERMAL-ASSISTED CHEMICAL VAPOR-DEPOSITION OF TETRAETHYLORTHOSILICATE OXIDE-FILMS
    NGUYEN, S
    DOBUZINSKY, D
    HARMON, D
    GLEASON, R
    FRIDMANN, S
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1990, 137 (07) : 2209 - 2215
  • [38] The role of parameters in plasma assisted vapor deposition of tin/tin-oxide coatings
    Keles, O
    Aykac, G
    Inal, OT
    SURFACE & COATINGS TECHNOLOGY, 2003, 172 (2-3): : 166 - 175
  • [39] STUDIES OF INTERFACIAL COMPOSITION OF TIN FILMS FORMED BY PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION USING AN INSITU SCRATCHING DEVICE
    HILTON, MR
    MIDDLEBROOK, AM
    RODRIGUES, G
    SALMERON, M
    SOMORJAI, GA
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (06): : 2797 - 2800
  • [40] ULTRAFINE ALUMINUM NITRIDE POWDER PRODUCED BY PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION OF TRIMETHYLALUMINUM
    KIM, KH
    HO, CH
    DOERR, H
    DESHPANDEY, C
    BUNSHAH, RF
    JOURNAL OF MATERIALS SCIENCE, 1992, 27 (10) : 2580 - 2588
12345