RAPID THERMAL-PROCESSING OF HIGH-QUALITY SILICON DIOXIDE FILMS

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作者：

NULMAN, J

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SOLID STATE TECHNOLOGY | 1986年 / 29卷 / 04期

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TM [电工技术]; TN [电子技术、通信技术];

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0808 ; 0809 ;

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页码：189 / 191

页数：3

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