TITANIUM DISILICIDE FORMATION BY SPUTTERING OF TITANIUM ON HEATED SILICON SUBSTRATE

被引:15
|
作者
TANIELIAN, M
BLACKSTONE, S
机构
关键词
D O I
10.1063/1.95352
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:673 / 675
页数:3
相关论文
共 50 条
  • [41] Thermal wave analysis of the formation of titanium disilicide on submicron lines.
    Brun, A
    Gerritsen, E
    Brun, N
    OPTICAL CHARACTERIZATION TECHNIQUES FOR HIGH-PERFORMANCE MICROELECTRONIC DEVICE MANFACTURING III, 1996, 2877 : 80 - 86
  • [42] FORMATION OF TITANIUM NITRIDE TITANIUM SILICIDE BY HIGH-PRESSURE NITRIDATION IN TITANIUM SILICON
    CHEN, SC
    TAMURA, H
    HARA, T
    INOUE, K
    ENDO, N
    KINOSHITA, K
    NAKAMURA, S
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1991, 30 (11A): : 2673 - 2678
  • [43] NUCLEATION AND GROWTH IN THE INITIAL-STAGE OF METASTABLE TITANIUM DISILICIDE FORMATION
    MA, Z
    XU, Y
    ALLEN, LH
    LEE, S
    JOURNAL OF APPLIED PHYSICS, 1993, 74 (04) : 2954 - 2956
  • [44] FORMATION AND EPITAXIAL-GROWTH OF TITANIUM-DISILICIDE ON SI (111)
    CHOI, CK
    PARK, HH
    LEE, JY
    CHO, KI
    PAEK, MC
    KWON, OJ
    KIM, KH
    YANG, SJ
    JOURNAL OF CRYSTAL GROWTH, 1991, 115 (1-4) : 579 - 588
  • [45] FORMATION OF METASTABLE C49 STRUCTURE IN TITANIUM DISILICIDE FILMS
    MAKOGON, YN
    INORGANIC MATERIALS, 1992, 28 (08) : 1315 - 1320
  • [46] Investigation into the Structure Formation and Properties of Materials in the Copper–Titanium Disilicide System
    S. A. Oglezneva
    M. N. Kachenyuk
    N. D. Ogleznev
    Russian Journal of Non-Ferrous Metals, 2017, 58 : 649 - 655
  • [47] HIGH-PRESSURE OXIDATION OF TITANIUM DISILICIDE POLYCRYSTALLINE SILICON COMPOSITE FILMS
    ROSNER, SJ
    AMANO, J
    TURNER, JE
    LADERMAN, SL
    DERVAN, A
    JOURNAL OF APPLIED PHYSICS, 1989, 65 (04) : 1729 - 1732
  • [48] Selective rapid thermal chemical vapor deposition of titanium disilicide on silicon and polysilicon
    Nie, LX
    Weintraub, CE
    Ozturk, MC
    RAPID THERMAL AND INTEGRATED PROCESSING VI, 1997, 470 : 139 - 144
  • [49] LPCVD OF TITANIUM DISILICIDE - SELECTIVITY OF GROWTH
    BOUTEVILLE, A
    ROYER, A
    REMY, JC
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (8A) : 2080 - 2083
  • [50] Characterisation of titanium disilicide thin films
    Satka, A.
    Liday, J.
    Srnanek, R.
    Vincze, A.
    Donoval, D.
    Kovac, J.
    Vesely, M.
    Michalka, M.
    MICROELECTRONICS JOURNAL, 2006, 37 (11) : 1389 - 1395