DESIGN CONSIDERATION FOR A 2-MU-M-PERIOD ION-IMPLANTED PROPAGATION TRACK

被引：1
|
作者：
SATOH, Y
MIYASHITA, T
OHASHI, M
BETSUI, K
KOMENOU, K
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1985年 / 57卷 / 08期
关键词：
D O I：
10.1063/1.334678
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
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页码：4080 / 4080
页数：1
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