HIGH-QUALITY AMORPHOUS-SILICON FILMS PREPARED BY ATMOSPHERIC-PRESSURE PHOTO-CVD

被引：1
|
作者：
KIM, WY [1 ]
KONAGAI, M [1 ]
TAKAHASHI, K [1 ]
机构：
[1] TOKYO INST TECHNOL, DEPT ELECT & ELECTR ENGN, MEGURO KU, TOKYO 152, JAPAN
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1988年 / 27卷 / 06期
关键词：
D O I：
10.1143/JJAP.27.L948
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：L948 / L950
页数：3
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