CATHODIC ARC DEPOSITION OF DIAMOND-LIKE CARBON - EFFECT OF BIAS VOLTAGE AND DEPOSITION ANGLE

被引：14

作者：

ROTHER, B ^{[1
]}

SIEGEL, J ^{[1
]}

MUHLING, I ^{[1
]}

FRITZSCH, H ^{[1
]}

BREUER, K ^{[1
]}

机构：

[1] TECHNOL UNIV CHEMNITZ,DEPT PHYS,O-9010 KARL MARX STADT,GERMANY

来源：

MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING | 1991年 / 140卷

关键词：

D O I：

10.1016/0921-5093(91)90513-M

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The highly ionized, atomic particle flux of a cathodic are discharge was applied to the fast rate deposition of carbon coatings al bias voltages from 0 to -400 V and at deposition angles of 0-degrees, 30-degrees and 60-degrees. The structure of the coating material grown directly from the ion flux was investigated by electron diffraction and by electron energy loss spectroscopy. The plasmon spectrum of the generally amorphous and sp3-dominated atomic arrangement showed a significant dependence upon the deposition parameters. The most diamond-like structure was found with a bias voltage of -50 to -100 V and at a deposition angle of 0-degrees.

引用

页码：780 / 783

页数：4

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