CHARACTERIZATION OF GA0.47IN0.53AS AND AL0.48IN0.52AS LAYERS GROWN LATTICE MATCHED ON INP BY MOLECULAR-BEAM EPITAXY

被引:25
|
作者
MASSIES, J [1 ]
ROCHETTE, JF [1 ]
ETIENNE, P [1 ]
DELESCLUSE, P [1 ]
HUBER, AM [1 ]
CHEVRIER, J [1 ]
机构
[1] THOMSON CSF,CENT RES LAB,F-91401 ORSAY,FRANCE
关键词
D O I
10.1016/0022-0248(83)90255-5
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
引用
收藏
页码:101 / 107
页数:7
相关论文
共 50 条
  • [21] MATERIAL PROPERTIES OF GA0.47IN0.53AS GROWN ON INP BY LOW-TEMPERATURE MOLECULAR-BEAM EPITAXY
    KUNZEL, H
    BOTTCHER, J
    GIBIS, R
    URMANN, G
    APPLIED PHYSICS LETTERS, 1992, 61 (11) : 1347 - 1349
  • [22] IMPROVEMENT OF OPTICAL CHARACTERISTICS OF AL0.48IN0.52AS GROWN BY MOLECULAR-BEAM EPITAXY
    WELCH, DF
    WICKS, GW
    EASTMAN, LF
    PARAYANTHAL, P
    POLLAK, FH
    APPLIED PHYSICS LETTERS, 1985, 46 (02) : 169 - 171
  • [23] MOLECULAR-BEAM EPITAXIAL-GROWTH AND OPTICAL-PROPERTIES OF GA0.47IN0.53AS AL0.48IN0.52AS ON INP AND GA1-XINXAS/GAAS ON GAAS QUANTUM WELLS
    GOLDSTEIN, L
    CHARASSE, MN
    JEANLOUIS, AM
    LEROUX, G
    ALLOVON, M
    MARZIN, JY
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (04): : 947 - 949
  • [24] Compositionally graded buffers on GaAs as substrates for Al0.48In0.52As/Ga0.47In0.53As MODFETs
    Fink, T
    Haupt, M
    Kaufel, G
    Kohler, K
    Braunstein, J
    Massler, H
    COMPOUND SEMICONDUCTORS 1996, 1997, (155): : 589 - 592
  • [25] CHARACTERIZATION OF INSULATED GATE GA0.47IN0.53AS/AL0.48IN0.52AS HETEROJUNCTION FIELD-EFFECT TRANSISTORS
    LEONARD, TP
    BREGMAN, J
    PEPPER, M
    DAVIES, GJ
    SCOTT, EG
    JOURNAL OF APPLIED PHYSICS, 1991, 70 (09) : 5090 - 5094
  • [26] Raman characterization of SiNx deposition on undoped Al0.48In0.52As and n+ Ga0.47In0.53As layers for InP high electron mobility transistor applications
    Boudart, B
    Gaquière, C
    Trassaert, S
    Constant, M
    Lorriaux, A
    Lefebvre, N
    APPLIED PHYSICS LETTERS, 1999, 74 (21) : 3221 - 3223
  • [27] Optical properties of In0.52Al0.48As layers and In0.53Ga0.47As/In0.52Al0.48As quantum well structures grown on (111)B InP substrates by molecular beam epitaxy
    Kawamura, Y
    Kamada, A
    Yoshimatsu, K
    Nakao, M
    Inoue, N
    1998 INTERNATIONAL CONFERENCE ON INDIUM PHOSPHIDE AND RELATED MATERIALS - CONFERENCE PROCEEDINGS, 1998, : 556 - 559
  • [28] Fabrication of 150-nm Al0.48In0.52As/Ga0.47In0.53As mHEMTs on GaAs substrates
    Wu XiaoFeng
    Liu HongXia
    Li HaiOu
    Li Qi
    Hu ShiGang
    Xi ZaiFang
    Zhao Jin
    SCIENCE CHINA-PHYSICS MECHANICS & ASTRONOMY, 2012, 55 (12) : 2389 - 2391
  • [29] Si spreading in lattice-matched In0.53Ga0.47As grown by molecular-beam epitaxy
    Skuras, E
    Long, AR
    Vögele, B
    Holland, MC
    Stanley, CR
    Johnson, EA
    van der Burgt, M
    Yaguchi, H
    Singleton, J
    PHYSICAL REVIEW B, 1999, 59 (16) : 10712 - 10718
  • [30] Fabrication of 150-nm Al0.48In0.52As/Ga0.47In0.53As mHEMTs on GaAs substrates
    XiaoFeng Wu
    HongXia Liu
    HaiOu Li
    Qi Li
    ShiGang Hu
    ZaiFang Xi
    Jin Zhao
    Science China Physics, Mechanics and Astronomy, 2012, 55 : 2389 - 2391