FORMATION OF TISI2 BY ELECTRON-BEAM ANNEALING OF ARSENIC IMPLANTED TITANIUM FILMS ON SILICON SUBSTRATES

被引：6
|
作者：
MAYDELLONDRUSZ, EA [1 ]
HARPER, RE [1 ]
WILSON, IH [1 ]
STEPHENS, KG [1 ]
机构：
[1] UNIV SURREY,DEPT ELECTR & ELECT ENGN,GUILDFORD GU2 5XH,SURREY,ENGLAND
来源：
VACUUM | 1984年 / 34卷 / 10-1期
关键词：
D O I：
10.1016/0042-207X(84)90185-4
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：995 / 999
页数：5
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