RELIABILITY IMPOSED DESIGN ASPECTS OF SUBMICROMETER POLYSILICON-EMITTER BIPOLAR-TRANSISTORS

被引:0
|
作者
BURGHARTZ, JN
MII, YJ
机构
[1] IBM Semiconductor Research and Development Center, Yorktown Heights
关键词
D O I
10.1109/55.225574
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The device reliability of narrow poly-emitter bipolar transistors with very shallow emitter junctions is studied experimentally. The excess base current due to nonuniform poly doping, which is typically seen in such devices, is found not to accelerate device degradation. The lower doping at the emitter edge due to known perimeter depletion and emitter plug effects (PPE's) leads to a reduced increase in base current per perimeter length with stress. The results show that bipolar device scaling can likely be pursued to a point where PPE's start to appear, and that lateral emitter grading is effective in improving the device reliability.
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页码:363 / 365
页数:3
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