IMPROVED POTENTIALS FOR NE + AR, NE + KR, AND NE + XE

被引：139
|
作者：
NG, CY
LEE, YT
BARKER, JA
机构：
[1] UNIV CHICAGO,JAMES FRANCK INST,CHICAGO,IL 60680
[2] IBM CORP,RES LAB,SAN JOSE,CA 95193
[3] UNIV CHICAGO,DEPT CHEM,CHICAGO,IL 60680
来源：
JOURNAL OF CHEMICAL PHYSICS | 1974年 / 61卷 / 05期
关键词：
D O I：
10.1063/1.1682201
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
引用
收藏
页码：1996 / 2003
页数：8
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