Surface and interface analysis at 3rd generation light sources

被引：2
|
作者：
Himpsel, FJ
Akatsu, H
Carlisle, JA
Sutherland, DGJ
Jimenez, I
Terminello, LJ
Jia, JJ
Callcott, TA
Samant, MG
Stohr, J
Ederer, DL
Perera, RCC
Tong, W
Shunh, DK
机构：
[1] LAWRENCE LIVERMORE NATL LAB, LIVERMORE, CA 94551 USA
[2] UNIV TENNESSEE, KNOXVILLE, TN 37996 USA
[3] IBM CORP, DIV RES, ALMADEN RES CTR, SAN JOSE, CA 95120 USA
[4] TULANE UNIV, NEW ORLEANS, LA 70118 USA
[5] UNIV CALIF BERKELEY, LAWRENCE BERKELEY LAB, BERKELEY, CA 94720 USA
来源：
PROGRESS IN SURFACE SCIENCE | 1995年 / 50卷 / 1-4期
关键词：
D O I：
10.1016/0079-6816(95)00043-7
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
A third generation or synchrotron radiation facilities is coming on line worldwide, whose brilliance exceeds previous ultraviolet and x-ray light sources by four orders of magnitude. The capabilities at second and third generation light sources are discussed, using examples in surface and interface chemistry and magnetic nanostructures. The authors' experience at the IBM-Tennessee-Tulane-LLNL-LBL undulator beam line will serve as a hands-on guide for work at one of the new facilities.
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页码：37 / 51
页数：15
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