RESIDUAL ABSORPTION IN HF AND DF LASER WINDOW MATERIALS FROM CONTAMINATION BY CARBONACEOUS AND OTHER IMPURITIES

被引：0
|
作者：
KLEIN, PH [1 ]
机构：
[1] USN RES LAB,WASHINGTON,DC 20375
来源：
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA | 1977年 / 67卷 / 02期
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中图分类号：
O4 [物理学];
学科分类号：
0702 ;
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页码：254 / 254
页数：1
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