XPS STUDY ON THE CHANGE OF SURFACE-POTENTIAL OF GASE AND INSE INDUCED BY AR+ SPUTTERING

被引：11
|
作者：
TAMBO, T
TATSUYAMA, C
机构：
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1984年 / 23卷 / 04期
关键词：
D O I：
10.1143/JJAP.23.397
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：397 / 401
页数：5
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