EFFECT OF CARBON AND OXYGEN PRECIPITATION ON GOLD DIFFUSION IN SILICON

被引:2
|
作者
ITOH, Y
SUGITA, Y
NOZAKI, T
机构
[1] TOYAMA UNIV,DEPT PHYS,TOYAMA 930,JAPAN
[2] KITAZATO UNIV,DEPT HYG SCI,SAGAMIHARA,KANAGAWA 228,JAPAN
关键词
D O I
10.1143/JJAP.28.1746
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:1746 / 1749
页数:4
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