SURFACE ANALYSIS USING COMPLEMENTARY ELECTRONIC AND CHEMICAL MEASUREMENTS

被引：15

作者：

HAAS, GA ^{[1
]}

机构：

[1] USN,RES LAB,WASHINGTON,DC 20375

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1976年 / 13卷 / 01期

关键词：

D O I：

10.1116/1.568903

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：479 / 486

页数：8

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