DEPOSITION OF TIN AND TI(O,C,N) HARD COATINGS BY A PLASMA ASSISTED CHEMICAL VAPOR-DEPOSITION PROCESS

被引：40

|

作者：

MAYR, P

STOCK, HR

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1986年 / 4卷 / 06期

关键词：

D O I：

10.1116/1.573714

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

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页码：2726 / 2730

页数：5

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