GROWTH OF ELECTRODEPOSITS AT THE EDGES OF CONDUCTOR PATHS ON INTEGRATED-CIRCUITS

被引：0

|

作者：

KLEIN, IE ^{[1
]}

YANIV, AE ^{[1
]}

HERSHCOVITZ, M ^{[1
]}

机构：

[1] ISRAELI ARMAMENT DEV AUTHOR,DEPT MAT & PROCESSES,HAIFA,ISRAEL

来源：

PLATING AND SURFACE FINISHING | 1989年 / 76卷 / 05期

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D O I：

暂无

中图分类号：

TF [冶金工业];

学科分类号：

0806 ;

摘要：

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页码：120 / 121

页数：2

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