COATINGS OF PYROCARBON AND SILICON-CARBIDE BY CHEMICAL VAPOR-DEPOSITION

被引：0

作者：

VOICE, EH ^{[1
]}

机构：

[1] ATOM ENERGY ESTAB,DRAGON PROJECT OFF,WINFRITH,DORCHESTER,DORSETSHIRE,ENGLAND

来源：

CHEMICAL ENGINEER-LONDON | 1974年 / 292期

关键词：

D O I：

暂无

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

引用

页码：785 / 792

页数：8

共 50 条

[21] ADHESION IMPROVEMENTS IN SILICON-CARBIDE DEPOSITED BY PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITION
MERNAGH, VA
KELLY, TC
AHERN, M
KENNEDY, AD
ADRIAANSEN, APM
RAMAEKERS, PPJ
MCDONNELL, L
KOEKOEK, R
[J]. SURFACE & COATINGS TECHNOLOGY, 1991, 49 (1-3): : 462 - 467
[22] THE INFLUENCE OF CHEMICAL VAPOR-DEPOSITION CONDITIONS ON THE STRUCTURAL STABILITY AND CRACKING OF SILICON-CARBIDE COATINGS ON CARBON CARBON COMPOSITES
BUCHANAN, FJ
LITTLE, JA
[J]. SURFACE & COATINGS TECHNOLOGY, 1992, 53 (02): : 137 - 146
[23] CHARACTERIZATION OF SILICON-CARBIDE COATINGS GROWN ON GRAPHITE BY CHEMICAL-VAPOR-DEPOSITION
ZHU, DW
HING, P
BROWN, P
SAHAI, Y
[J]. JOURNAL OF MATERIALS PROCESSING TECHNOLOGY, 1995, 48 (1-4) : 517 - 523
[24] CHEMICAL VAPOR-DEPOSITION OF SILICON-CARBIDE AND SILICON-NITRIDE - CHEMISTRYS CONTRIBUTION TO MODERN SILICON CERAMICS
FITZER, E
HEGEN, D
[J]. ANGEWANDTE CHEMIE-INTERNATIONAL EDITION, 1979, 18 (04) : 295 - 304
[25] GAS-PHASE KINETICS ANALYSIS AND IMPLICATIONS FOR SILICON-CARBIDE CHEMICAL VAPOR-DEPOSITION
STINESPRING, CD
WORMHOUDT, JC
[J]. JOURNAL OF CRYSTAL GROWTH, 1988, 87 (04) : 481 - 493
[26] THE EFFECT OF ARGON ADDITION ON THE MICROSTRUCTURE, TEXTURE AND PHASES OF SILICON-CARBIDE PREPARED BY CHEMICAL VAPOR-DEPOSITION
LU, YM
HON, MH
[J]. NIPPON SERAMIKKUSU KYOKAI GAKUJUTSU RONBUNSHI-JOURNAL OF THE CERAMIC SOCIETY OF JAPAN, 1991, 99 (12): : 1175 - 1178
[27] GROWTH OF SOLID-SOLUTIONS OF ALUMINUM NITRIDE AND SILICON-CARBIDE BY METALORGANIC CHEMICAL VAPOR-DEPOSITION
JENKINS, I
IRVINE, KG
SPENCER, MG
DMITRIEV, V
CHEN, N
[J]. JOURNAL OF CRYSTAL GROWTH, 1993, 128 (1-4) : 375 - 378
[28] CHEMICAL VAPOR-DEPOSITION OF SILICON-CARBIDE POWDERS USING PULSED CO2-LASERS
SCHOLZ, M
FUSS, W
KOMPA, KL
[J]. ADVANCED MATERIALS, 1993, 5 (01) : 38 - 40
[29] THE EFFECT OF SUBSTRATE MATERIALS ON THE MICROSTRUCTURE AND PHASES OF SILICON-CARBIDE PREPARED BY CHEMICAL VAPOR-DEPOSITION (CVD)
PARK, YS
KIM, MH
LEE, JY
[J]. JOURNAL OF MATERIALS SCIENCE LETTERS, 1989, 8 (03) : 321 - 325
[30] REACTOR DESIGN FOR CHEMICAL VAPOR-DEPOSITION OF TUNGSTEN CARBIDE COATINGS
GARG, D
KELLY, CM
[J]. SURFACE & COATINGS TECHNOLOGY, 1992, 54 (1-3): : 198 - 203

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